Background Aluminum nitride (AlN) is a promising ultra-wide bandgap (UWBG) semiconductor for next-generation power electronics due to its remarkable material attributes, including the largest bandgap in the UWBG semiconductor family, high breakdown field, and superior thermal conductivity. In recent years, AlN Schottky barrier diodes (SBDs) have already...

Background Silicon (Si) is the most widely used semiconductor for many reasons including its abundance, cost-effectiveness, and excellent electrical properties. However, its lower breakdown voltage and thermal limitations make it less suitable for high-power, high- frequency and high-temperature applications. The uniformity in silicon's crystal...

Background Beta-gallium oxide (β-Ga2O3) has become a promising candidate for high-power, high-voltage, and high-frequency applications due to its ultrawide bandgap (-4.8 eV), high critical electric field (-8 MV/cm), and large Baliga’s figure of merit. Compared with lateral devices such as high electron mobility transistors (HEMTs), vertical...